Investigation of optical and electrical properties of titanium oxynitride films

Abstract

In this work, titanium oxynitride films were obtained on the surface of glass and silicon substrates by magnetron sputtering in a mixture of argon-oxygen-nitrogen gases. The thickness of the obtained films, their deposition rate, and surface morphology were estimated depending on the type of substrate. The optical and electrical properties of films produced on the glass surface have been studied. A comparison of optical data with literature data showed the formation of amorphous films with a composition close to the stoichiometric composition of TiO1.27N0.49. The results showed that the obtained properties correspond to the literature data, which opens up new prospects for the use of the obtained titanium oxynitride films as an active element of memristors, and in other important areas of modern materials science.