Structure of porous silicon films

dc.contributor.authorZhanabaev, Z.Zh.
dc.contributor.authorTimoshenko, V.Yu.
dc.contributor.authorTurmukhambetov, A.Zh.
dc.contributor.authorGrevtseva, T.Yu.
dc.contributor.authorAssilbayeva, R.B.
dc.date.accessioned2019-05-21T06:32:58Z
dc.date.available2019-05-21T06:32:58Z
dc.date.issued2017-06-05
dc.description.abstractThe present work is devoted to experimental and theoretical study of silicon films grown by metal-induced chemical etching. Photos of film surfaces were obtained by use of scanning electron microscope. It was shown that variation of etching time leads to changing of informational entropy of the films. This parameter increases for lateral sides of surfaces, and decreases for their top layers. This fact can be used for explanation of ambiguous effects at reflection of photons from surfaces of porous silicon films.ru_RU
dc.identifier.citationZhanabaev, Z.Zh. Structure of porous silicon films / Z.Zh. Zhanabaev, V.Yu. Timoshenko, A.Zh. Turmukhambetov [et al.] // Eurasian Physical Technical Journal. – 2017. – Vol.14. – № 1(27). – P. 30-33.ru_RU
dc.identifier.issn1811-1165
dc.identifier.issn2413-2179
dc.identifier.urihttps://rep.buketov.edu.kz//handle/data/5965
dc.language.isoenru_RU
dc.publisherYe.A.Buketov Karaganda State University Publishing houseru_RU
dc.relation.ispartofseriesEurasian Physical Technical Journal.;Vol. 14 № 1(27)
dc.subjectporous siliconru_RU
dc.subjectnanostructureru_RU
dc.subjectmorphologyru_RU
dc.subjectmetal-induced chemical etchingru_RU
dc.subjectinformational entropyru_RU
dc.titleStructure of porous silicon filmsru_RU
dc.typeArticleru_RU

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